According to Jiejia Weichuang, recently, photomask cleaning equipment independently developed by the company's subsidiary Chuangwei Microelectronics Co., Ltd. completed verification and mass production delivery at several terminal Fab plants. The equipment provided met advanced process requirements in terms of particle control, no water marks, and surface cleanliness. In the field of photomask cleaning, Chuangwei Microelectronics has formed a complete product matrix, covering 5"-9" quartz photomasks of various sizes, supporting fully automatic front and back cleaning, optional AOI particle detection, and automatic SMIF loading and unloading. The localization rate of key components exceeds 80%, and the software is completely independently developed.

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