• Xanadu Quantum Technologies entered a new phase of collaboration with Mitsubishi Chemical on quantum-driven semiconductor fabrication research focused on EUV lithography.
• Project targets radiation-induced blur in EUV photoresists, aiming to integrate quantum simulation outputs into Mitsubishi’s multiscale models to predict blur.
• Planned outcome is an FTQC-ready software pipeline to identify resist materials that reduce blurring for next-generation chip manufacturing.
• Work is backed by Canada’s NRC IRAP program, which has provided Xanadu advisory services and more than $800,000 in prior funding.
• Japan support comes from the Strategic Innovation Promotion Program led by AIST, including G-QuAT, to scale the partners’ earlier EUV modeling results.

Disclaimer: This news brief was created by Public Technologies (PUBT) using generative artificial intelligence. While PUBT strives to provide accurate and timely information, this AI-generated content is for informational purposes only and should not be interpreted as financial, investment, or legal advice. Xanadu Quantum Technologies Ltd. published the original content used to generate this news brief via GlobeNewswire (Ref. ID: 202608271344PRIMZONEFULLFEED9817309) on August 27, 2026, and is solely responsible for the information contained therein.