Luwei Optoelectronics said at the 2026 semi-annual performance briefing held on September 18 that at present, customer verification of the 40nm complete mask version is progressing in an orderly manner, the 40nm and 28nm single-layer mask versions have been verified and supplied, and the 28nm—14nm complete mask version is being implemented in the second phase of the Lucite project. It is currently being prepared according to the plan, and is committed to breaking the monopoly of overseas companies in the high-end manufacturing field.

Disclaimer:Webull uses external vendor Google Translation Service for news translations where we endeavour to ensure these are correct, however, we recommend that you please double-check this information accordingly. Webull is not responsible for translation errors or issues.