The Zhitong Finance App learned that, according to reports, at the 26th China International Industry Fair, Landau Suiyan publicly displayed a prototype EUV light source system for the first time. This is the most advanced domestic EUV light source prototype currently on public display. It is known as the “heart” of a high-end lithography machine. This marks a major breakthrough in the field of domestic EUV light sources, and a key step has been taken from laboratories to industrialization.
Extreme ultraviolet (EUV) light sources are one of the three core components of advanced chip manufacturing at 7nm and below. They have long been restricted by overseas technology monopolies and embargoes, and are a key link limiting the autonomy and control of China's high-end chips. According to reports, the localization rate of the light source system exhibited this time has reached 90%. The vast majority of core components are independently developed. The technical route is consistent with leading international manufacturers, and can be used for chip exposure testing.
However, it will still take 3 to 5 years for this light source system to be mass-produced. Currently, the core challenges it faces are improving output power and long-term operation stability. Commercial EUV lithography systems require light sources up to hundreds of watts and remain highly reliable during extended operation. Taking ASML as an example, its EUV light source system has achieved mass production applications since the 250W version was launched in 2018, and is currently evolving to a higher 1000W power level.
According to the official website, the Landau Flintnano LPP-OXXO low-power EUV light source system is already in the commercialization stage. The driving laser power is 1000 W, the laser frequency is 1 to 20 kHz, the conversion efficiency is greater than 2%, the EUV energy is greater than 15 W, the continuous working time is more than 100 hours, and the plasma size is 60 microns. The Flintmicro-LPP series high power extreme ultraviolet light source system has completed the proof of principle.
Analysts believe that the prototype presented by Landau Suiyan at the industrial fair has now verified the viability of the technical route, but there is still a clear gap between the maturity of the products required for industrial-grade applications. From 15W EUV energy output to mass production requirements of hundreds of watts, Landau Flinite needs to overcome not only multiple increases in power, but also comprehensive breakthroughs in plasma stability, light source life, and system integration reliability.
Guosheng Securities believes that domestic demand for domestic lithography machine space is greater than domestic supply, and high-end lithography machines are still in the research and development stage, and large-scale mass production has not yet been achieved. As geopolitical risks continue to shrink, there is plenty of room for alternatives to the domestic lithography machine industry chain.
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